Claudia Li may be one of the most exciting new designers to come to the New York Fashion Week runways. Having studied Fine Arts at the Central Academy of Fine Arts in Beijing and then studying fashion at Central Saint Martins and finally at Parsons School of Design, her voice is a strong and unique one on the fashion calendar. Exclusive to Document, these studies are for her eponymous Fall/Winter 2016 show, which debuted today. Evolved from simple pen and paper ideas, draped fabrics on a form are photographed and then manipulated in Photoshop; shapes are altered; forms are created; and images are superimposed. The experimental way of working enables Claudia to see how the clothing will hang on the form, playing with scale and body placement. The unique technique harkens back to her studies at art school with approach much like a sculptor or architect taking the analog to digital then back into the physical world.

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